China talks up EUV progress, but gap with ASML remains wide

China is touting a breakthrough in one of the semiconductor industry's toughest technologies: extreme ultraviolet lithography. But how close is it really to challenging global chipmaking leaders? Chinese startup Langdao Silex recently unveiled a prototype EUV light source built with what it claims are 90 percent dom…

Opens the original publisher in a new tab. Full articles belong to their publishers; a subscription may be required.